Wafer Drying Machine

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Wafer Drying Machine
Posting date : Apr 15, 2014
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85-
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Equipment overview: Wafer drying machine has high cleanliness spin rinsedry function. Mainly used for silicon wafer, reticle, solar cells and other similar materials washing drying. Structure: Working cavity structure, the largest processing diameter150mm. S is a double cassette structure system constitution: The machine adopts double station (or single) stack,product this type structure, each station can be run independently without mutual interference. Can realize automatic process including rotary flushing, drying, nitrogen resistivity monitoring, anti-static control, cavity drying, fault display alarm, system cleaning. The principle and characteristic of structure Cleaning technology High power brushless motor drive Cleaning work Rotating nitrogen sealing technology Deionized water control ESD control Earthquake, seismic isolation technology Speed, counting control technology Brake control technology System control technology Processing software Particle control performance Security and protection Door position monitoring and interlocking Production technology

ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO J.W.Park, TEL : +82-2-552-7676, E-mail : E-mail : Contact us
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
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