0.2µm Ultrafine Titanium Filter for High-Purity Gas

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Product
0.2µm Ultrafine Titanium Filter for High-Purity Gas
Posting date : Mar 06, 2026
Membership
Free Member Scince Feb 07, 2023
FOB Price
20 USD/PC
Min. Order Quantity
5
Supply Abillity
100000pcs/week
Port
Shanghai or Tianjin
Payment Terms
T/T、PayPal
Package
in wooden case or carton box
Keyword :
Category
Contact
Lisa
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Product Detail
Company Info
 
Quick Detail
Place of Origin
China [CN]
Brand Name
TOPTITECH
HS-CODE
-
Package & Delivery Lead Time
Package
in wooden case or carton box
Delivery Lead Time
in 10-15 days
Detailed Description

0.2µm Ultrafine Titanium Filter for High-Purity Gas

 

This titanium filter element from TOPTITECh is precision-manufactured from Gr1 pure titanium using a high-temperature sintering process, forming a structurally stable microporous filtration layer. The inherent inertness of titanium ensures no reaction or particle shedding when in contact with various high-purity gases, maintaining the original purity of the gas medium throughout the filtration process to meet the stringent cleanliness requirements of precision manufacturing.

 

Designed specifically for point-of-use high-purity gas filtration applications, this filter features a compact structure with standard connections that integrate seamlessly with piping systems after installation. The sintered titanium construction delivers exceptional backwash regeneration performance, allowing repeated cleaning and reuse while maintaining filtration effectiveness, providing stable and long-lasting filtration protection for high-purity gas delivery systems.

 

Product Specifications

MaterialGr1 titanium

Diameter: 40mm

Length: 50mm

Pore size: 0.2µm

Connector: 1-inch NPT Male Thread

Technique: Sintering

 

Product Features
Homogeneous Material Integration

The filter element features a continuous titanium structure with no dissimilar material seals at the connection interface, eliminating leakage risks and seal degradation caused by differential thermal expansion.

 

Fiber-Free Rigid Filtration Layer

The filtration medium is formed through metal powder sintering, distinct from wound or pleated filter media. This construction eliminates fiber release risks and maintains structural integrity during backpulsing or pressure fluctuations.

 

Ready-to-Use Terminal Connection

The integrated standard threaded interface connects directly to gas equipment inlets without adapters or line modifications, establishing a mechanical union between the filter element and gas delivery system.

 

Low Pressure Drop High Flow Characteristics

The sintered pore structure creates interconnected three-dimensional pathways that minimize flow resistance, achieving fine filtration while maintaining throughput without compromising downstream equipment performance.

 

Short-Path Flow Channel Design

The minimized distance between filtration medium and connection interface reduces gas residence time within the filter element, limiting contact opportunities with internal surfaces and minimizing adsorption or reaction risks.

 

Heat-Tracing Compatible Construction

The all-metal sintered body withstands process temperatures required for heat-traced applications, maintaining filtration performance in scenarios where heating prevents gas condensation or adsorption during delivery.

 

Product Applications
Semiconductor Manufacturing Gas Filtration
Installed at gas inlets of epitaxy, deposition, and etching equipment to remove fine particles from gas sources and protect wafer surfaces from particulate contamination.

Ultra-High Purity Gas Delivery Systems
Mounted at terminal outlets of gas cabinets or distribution boxes to perform final filtration of high-purity gases at point-of-use, ensuring gas purity meets process requirements.

Specialty Gas Precision Filtration
Applied in pipelines handling flammable, pyrophoric, and corrosive gases such as silane, phosphine, and arsine, with titanium inertness ensuring compatibility without reaction or catalytic decomposition.

Critical Process Particle Retention
Positioned upstream of sensitive processes including ion implantation and diffusion to intercept trace particles generated by valve and mass flow controller wear, safeguarding equipment stability.

Gas Mixing System Protection
Installed at outlets of multi-channel gas mixers to filter impurities from blended gases, preventing particle migration into downstream process chambers or packaging operations.

Precision Analytical Instrument Carrier Gas Filtration
Used at gas inlets of gas chromatographs and mass spectrometers to remove fine particles from carrier gases, protecting core components and ensuring measurement accuracy and repeatability.

 


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