Supply,;..~~#--GaAs / Ge film cleaning equipmentSuzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.

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Home > Product > Supply,;..~~#--GaAs / Ge film cleaning equipmentSuzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.
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Supply,;..~~#--GaAs / Ge film cleaning equipmentSuzhou Hua Lin Kena Semiconducto...
Posting date : Oct 08, 2011
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Free Member Scince Jan 07, 2011
FOB Price
Negotiable
Payment Terms
Negotiable
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Negotiable
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Place of Origin
China [CN]
HS-CODE
28-
Package & Delivery Lead Time
Package
Negotiable
Delivery Lead Time
Negotiable 2012-10-08
Detailed Description
Product information: 1) mainly used in a variety of materials, nano materials, semiconductor manufacturing process, Photo, DIFF, WET / Etch, Eglass, Nickel and other processes of 2 to 12-inch wafer processing; 2) the main process: customized according to customer demand using HF/HNO3/HCL / H3PO4/H2SO4 / SC1/SC2/H2SO4/NMP/BOE other liquid, combined with ultrasound, throwing, loop filter, heating, mechanical transmission, automatic with fluid, fluid replacement and other functions, the effective removal silicon metal ions, particles, dirt, such as plastic, so as to achieve the desired effect; 3) Control mode: manual, semi-automatic; 4) Material: according to customer requirements and technology selection, optional PP, PVC, PVDF, PTFE, quartz, SUS, and other materials;

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