Supply,;..~~#Wafer cleaning machineSuzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.

Selling leads

Supply,;..~~#Wafer cleaning machineSuzhou Hua Lin Kena Semiconductor Equipment T...

Posting date : Oct 08, 2011

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Membership

Free Member Scince Jan 07, 2011

FOB Price

Negotiable

Payment Terms

Negotiable

Package

Negotiable

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Category

CHEMICAL | Inorganic chemic

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Selling Leads Detail

Company Info

Quick Detail

Place of Origin

China [CN]

HS-CODE

28-

Package & Delivery Lead Time

Package

Negotiable

Delivery Lead Time

Negotiable 2012-10-08

Detailed Description

Wafer Cleaning Products: 1) mainly used in integrated circuit manufacturing process, Photo, DIFF, WET / Etch, Eglass, Nickel and other processes of 2 to 12-inch wafer processing; 2) the main process: customized according to customer demand, the use of HF/HNO3/HCL / H3PO4/H2SO4 / SC1/SC2/H2SO4/NMP/BOE other liquid, combined with ultrasound, throwing, loop filter, heating, mechanical transmission, automatic with fluid, fluid replacement and other functions, the effective removal of silicon metal ions, particles, dirt, such as plastic, so as to achieve the desired effect; 3) Control mode: manual, semi-automatic; 4) Material: according to customer requirements and technology selection, optional PP, PVC, PVDF, PTFE, quartz, SUS, and other materials;