plasma enhanced chemical vapor deposition SiN coating machine

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Product
plasma enhanced chemical vapor deposition SiN coating machine
Posting date : Jul 17, 2020
Membership
Free Member Scince Jul 13, 2020
FOB Price
100000
Min. Order Quantity
1
Supply Abillity
50
Port
qingdao,shanghai,
Payment Terms
T/T, L/C, Pay Later,Western Union,VISA
Package
wooden box packaging
Keyword :
CVD
Category
Contact
jibin wang
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Product Detail
Company Info
 
Quick Detail
Place of Origin
China [CN]
Brand Name
CYKY
Model Number
CY-PECVD-450
HS-CODE
8486-20
Package & Delivery Lead Time
Package
wooden box packaging
Delivery Lead Time
30 days
Detailed Description
CY-PECVD-450 chemical vapor deposition adopts plasma enhanced chemical vapor deposition technology, which can use high-energy plasma to promote the reaction process, effectively increase the reaction speed and reduce the reaction temperature.
 
  • It is suitable for depositing thin films of silicon nitride, amorphous silicon and microcrystalline silicon on different substrates such as optical glass, silicon, quartz and stainless steel.
  • It has good film-forming quality, less pinholes and is not easy to crack. It is suitable for the preparation of amorphous silicon and microcrystalline silicon thin film solar cell devices.
  • It can be widely used in the scientific research and small batch preparation of thin film materials in Colleges and universities and scientific research institutes.
 
Technical parameter
 
Type
CY-PECVD-450
Vacuum chamber
front opening door,φ300mm X 300mm,stainless steel
viewing window:φ100mm with baffle
Vacuum pump set
Backing pump: rotary vane pump pumping speed is 1.1L/s
Secondary pump: Turbo molecular pump pumping speed 600L/s
Limiting vacuum
10-6Pa
10-4Pa(Within 30 minutes)
Vacuum(deposition)
0.133~133Pa,adjusted according to the process
RF power
13.56MHz,500W (automatch)
Flow control
 mass flowmeter(default Ar,0~200sccm)
Dimensions
1100mm x 800mm x1100mm
 

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